LEVO LEVITOR

The Levitor is a single-wafer Rapid Thermal Processing- system

The LEVO 6300 enables a full range of critical Rapid Thermal Processing (RTP) applications, including:

  • Dopant Activation – Precisely activate implanted ions in silicon for optimal electrical behaviour
  • Contact Annealing – Form highly conductive contacts without material diffusion or degradation.
  • Encapsulation – Apply protective dielectric layers that shield devices from oxidation, moisture, and contamination
  • Rapid Thermal Oxidation – Grow high-quality SiO2 or TiO2 layer rapidly uniformly

The LEVO 6300 uses conduction-based heating for precise temperature control and even heating. Its fast heating and cooling cycles work quickly, no matter the film type, wafer pattern, or material, leading to better results and shorter cycle times.

The LEVO 6300 supports a wide range of gases like N₂, Ar, He, O₂, NH₃, and even 100% H₂, making it highly versatile. Built for high-throughput environments, it features advanced control systems, better leak protection, and full automation.

From R&D labs to full-scale production, manufacturers across Europe and Asia rely on the LEVO 6300 for consistent performance, reduced cost of ownership, and industry-leading reliability.

Processes

  • Dopant annealing
  • Contact annealing
  • Wafer Encapsulation
  • Rapid Thermal Oxidation (SiO2 & TiO2)

Features and Benefits

  • High throughput (>30 wrfs/hr)
  • Compatible with 200 mm and 300 mm silicon wafers
  • Ramp up rate to 200 K/s
  • One step anneal
  • Energy transfer is independent of films and patterns on wafer
  • No box/susceptor needed
  • Fully automated wafer handling
  • Outstanding temperature uniformity
  • Precise environmental control
  • Configurable with 2 process modules
  • SMIFF compatibility
  • Emissivity-independent annealing