SOLUTIONS
LEVITOR LEVO
The Levitor LEVO is a single-wafer Rapid Thermal Processing- system is based on the unique concept of conduction rather than the conventional method of radiation heating. This technology is used to rapidly heat and cool-down wafers.
The Levitor Levo’s novel and patented “gas-bearing” levitates the wafer 150µm apart from two high-mass blocks that act as a thermal flywheel. In this setup, the wafer is heated
through conduction rather than radiation, while the energy is stored in the hot high mass blocks.
LEVITRACK
The Levitrack Atomic Layer Deposition (ALD) system is designed for high-volume production, depositing ultra-thin layers to improve solar cell efficiency. It generates passivation and intermediate multi-stack layers, which are applied in the tandem cell of a standard cell with a perovskite cell on top.
Recent developments on the Levitrack system enabled multi-layer ALD in continuous mass-production of tandem solar cells.
LEVO SiC RTA
The Levitor LEVO SiC RTA is a single-wafer Rapid Thermal Annealing system specifically designed for Silicon Carbide (SiC) wafers. It utilizes conduction-based heating instead of traditional radiation heating, ensuring fast and efficient wafer heating and cooling. This enables precise temperature control from 100°C to 1200°C, delivering excellent uniformity, high throughput, and repeatability—crucial for SiC processing.
